SEMATECH DOC ID #: 04114595D-ENG

Title: Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2007 Version)

Author(s): Amir Azordegan;Andras Vladar;Benjamin Bunday;Bhanwar Singh;Bill Banke;Carsten Hartig;Chas Archie;David Joy;Eric Solecky;Gary Cao;John Villarrubia;Michael Postek;

Document date: 01/15/2008

Descriptor(s): scanning electron microscopes;critical dimension;equipment specifications;performance specifications;

This report from the LITG440M project is a unified specification for advanced critical dimension scanning electron microscope (CD-SEM) measurement instruments developed by International SEMATECH Manufacturing Initiative (ISMI) and the National Institute of Standards and Technology (NIST). This specification, intended for the CD-SEM user and supplier community, represents the ISMI member companies' consensus on CD-SEM requirements. It sets forth methodologies for measuring various metrics for benchmarking and qualifying CD-SEMs and for driving suppliers to meet customer requirements and the International Technology Roadmap for Semiconductors (ITRS). It is also a useful source for developing in-house metrology practices, training new personnel, and providing guidance for writing acceptance specifications. This revision includes updates to precision, matching, and resolution.

This revision includes additions to throughput, discussions about challenges to CD-SEM posed by the advent of contour metrology and double patterning, a new section about fleet management and recipe portability, and a discussion of uncertainly and sampling error.

下載地址：http://ismi.sematech.org/docubase/document/4595deng.pdf。